PLATFORM PROFILEASML
ASML
9.62
B-index (V3.1)
BLACK HOLE
Capture1.648
Escape0.171
Key Structural Insight
ASML makes the machine that makes the machines. p=10, s=1, h=1. Deepest infrastructure lock-in on Earth.
Eleven-Parameter Profile
Data Depth6/10
Memory8/10
Action9/10
Process10/10
Network7/10
Closeness7/10
Portability1/10
Substitutability1/10
Human Fallback1/10
Org Depth9/10
Momentum6/10
Capture Escape Extended
V3.1 Decomposition
| Component | Value | Formula |
|---|---|---|
| CES₄ capture core | 0.8180 | CES(d, m, a, p) |
| Knowledge synergy σₖ | 0.6928 | √(d · m) |
| Operability synergy σₒ | 0.9487 | √(a · p) |
| Synergy boost | 1.2462 | 1 + 0.3·(σₖ + σₒ)/2 |
| Org-depth multiplier | 1.4500 | 1 + 0.5·o |
| Momentum multiplier | 1.1800 | 1 + 0.3·t |
| Total Capture | 1.6483 | c·(1+0.5n)·core·syn·org·mom |
| CES₃ escape core | 0.1000 | CES(x, s, h) |
| Feedback attenuation | 0.7137 | max(0.3, 1 − 0.35·core) |
| Total Escape | 0.1714 | ε + escCore · feedback |
| B = Capture / Escape | 9.62 | 1.648 / 0.171 |
Scoring Rationale
Only EUV lithography manufacturer in the world. 30+ years R&D, thousands of patents. Without ASML, no chips below 7nm. Even TSMC depends entirely on ASML equipment.
Parameter Sensitivity
MARGINAL B-INDEX CHANGE PER ±1 SCORE SHIFT
PORT1-3.95
SUB1-3.95
FALL1-3.95
CLOSE7+2.75
DATA6+0.94
MEM8+0.79
ACT9+0.78
NET7+0.71
ORG9+0.66
MOM6+0.49
PROC10+0.37
+ raises B (deepens lock-in)− lowers B (aids escape)